Download Dry Etching Technology for Semiconductors by Kazuo Nojiri PDF

By Kazuo Nojiri

This booklet is a must have connection with dry etching expertise for semiconductors, in an effort to let engineers to improve new etching methods for extra miniaturization and integration of semiconductor built-in circuits. The writer describes the machine production stream, and explains during which a part of the move dry etching is basically used. The content material is designed as a pragmatic advisor for engineers operating at chip makers, gear providers and fabrics providers, and collage scholars learning plasma, targeting the themes they wish such a lot, similar to exact etching techniques for every fabric (Si, SiO2, steel and so forth) utilized in semiconductor units, etching apparatus utilized in production fabs, rationalization of why a specific plasma resource and fuel chemistry are used for the etching of every fabric, and the way to enhance etching processes. The newest, key applied sciences also are defined, corresponding to 3D IC Etching, twin Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.

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